Dielectric Properties of Plasma Oxides for Microfabricated Ion Traps

Alexander Zesar; Helmut Schönherr; Michael Sieberer; David Seebacher; Clemens Rössler; Klemens Schüppert; Elmar Aschauer; Peter Hadley

Dielectric Properties of Plasma Oxides for Microfabricated Ion Traps

Alexander Zesar, Helmut Schönherr, Michael Sieberer, David Seebacher, Clemens Rössler, Klemens Schüppert, Elmar Aschauer, Peter Hadley

Institut für Festkörperphysik (5130)

Publikation: Beitrag in Buch/Bericht/Konferenzband › Beitrag in einem Konferenzband › Begutachtung

Abstract

Microfabricated ion traps are a key technology for trapped ion quantum computing. In chip-based ion traps metal layers are isolated by plasma enhanced chemical vapor deposited (PECVD) dielectrics. Both dielectric losses and charging currents of parasitic capacitances lead to power dissipation, which has adversely effects trap performance and, therefore, limits scaling. The presented work investigates properties of dielectric materials in order to develop strategies for minimizing the total heat dissipation.

Originalsprache	englisch
Titel	MikroSystemTechnik Kongress 2021
Untertitel	Mikroelektronik, Mikrosystemtechnik und ihre Anwendungen - Innovative Produkte fur zukunftsfahige Markte, Proceedings
Herausgeber (Verlag)	VDE-Verlag GmbH, Berlin, Offenbach
Seiten	363-364
Seitenumfang	2
ISBN (elektronisch)	9783800756575
Publikationsstatus	Veröffentlicht - 2021
Veranstaltung	MikroSystemTechnik Kongress 2021 : Mikroelektronik, Mikrosystemtechnik und ihre Anwendungen - Innovative Produkte für zukunftsfähige Märkte - Stuttgart-Ludwigsburg, Deutschland Dauer: 8 Nov. 2021 → 10 Nov. 2021

Konferenz

Konferenz	MikroSystemTechnik Kongress 2021
Land/Gebiet	Deutschland
Ort	Stuttgart-Ludwigsburg
Zeitraum	8/11/21 → 10/11/21

ASJC Scopus subject areas

Hardware und Architektur
Elektrotechnik und Elektronik
Elektronische, optische und magnetische Materialien

Andere Dateien und Links

Verknüpfung zur Publikation in Scopus

Dieses zitieren

Zesar, A., Schönherr, H., Sieberer, M., Seebacher, D., Rössler, C., Schüppert, K., Aschauer, E., & Hadley, P. (2021). Dielectric Properties of Plasma Oxides for Microfabricated Ion Traps. in MikroSystemTechnik Kongress 2021: Mikroelektronik, Mikrosystemtechnik und ihre Anwendungen - Innovative Produkte fur zukunftsfahige Markte, Proceedings (S. 363-364). VDE-Verlag GmbH, Berlin, Offenbach.

Dielectric Properties of Plasma Oxides for Microfabricated Ion Traps. / Zesar, Alexander; Schönherr, Helmut; Sieberer, Michael et al.
MikroSystemTechnik Kongress 2021: Mikroelektronik, Mikrosystemtechnik und ihre Anwendungen - Innovative Produkte fur zukunftsfahige Markte, Proceedings. VDE-Verlag GmbH, Berlin, Offenbach, 2021. S. 363-364.

Publikation: Beitrag in Buch/Bericht/Konferenzband › Beitrag in einem Konferenzband › Begutachtung

Zesar, A, Schönherr, H, Sieberer, M, Seebacher, D, Rössler, C, Schüppert, K, Aschauer, E & Hadley, P 2021, Dielectric Properties of Plasma Oxides for Microfabricated Ion Traps. in MikroSystemTechnik Kongress 2021: Mikroelektronik, Mikrosystemtechnik und ihre Anwendungen - Innovative Produkte fur zukunftsfahige Markte, Proceedings. VDE-Verlag GmbH, Berlin, Offenbach, S. 363-364, MikroSystemTechnik Kongress 2021 , Stuttgart-Ludwigsburg, Deutschland, 8/11/21.

@inproceedings{168f811c85af4b48a27ccb153388e7f0,

title = "Dielectric Properties of Plasma Oxides for Microfabricated Ion Traps",

abstract = "Microfabricated ion traps are a key technology for trapped ion quantum computing. In chip-based ion traps metal layers are isolated by plasma enhanced chemical vapor deposited (PECVD) dielectrics. Both dielectric losses and charging currents of parasitic capacitances lead to power dissipation, which has adversely effects trap performance and, therefore, limits scaling. The presented work investigates properties of dielectric materials in order to develop strategies for minimizing the total heat dissipation.",

author = "Alexander Zesar and Helmut Sch{\"o}nherr and Michael Sieberer and David Seebacher and Clemens R{\"o}ssler and Klemens Sch{\"u}ppert and Elmar Aschauer and Peter Hadley",

note = "Publisher Copyright: {\textcopyright} VDE VERLAG GMBH · Berlin · Offenbach; MikroSystemTechnik Congress 2021 : Microelectronics, Microsystems Engineering and their Applications - Innovative Products for Future-Oriented Markets ; Conference date: 08-11-2021 Through 10-11-2021",

year = "2021",

language = "English",

pages = "363--364",

booktitle = "MikroSystemTechnik Kongress 2021",

publisher = "VDE-Verlag GmbH, Berlin, Offenbach",

}

TY - GEN

T1 - Dielectric Properties of Plasma Oxides for Microfabricated Ion Traps

AU - Zesar, Alexander

AU - Schönherr, Helmut

AU - Sieberer, Michael

AU - Seebacher, David

AU - Rössler, Clemens

AU - Schüppert, Klemens

AU - Aschauer, Elmar

AU - Hadley, Peter

PY - 2021

Y1 - 2021

N2 - Microfabricated ion traps are a key technology for trapped ion quantum computing. In chip-based ion traps metal layers are isolated by plasma enhanced chemical vapor deposited (PECVD) dielectrics. Both dielectric losses and charging currents of parasitic capacitances lead to power dissipation, which has adversely effects trap performance and, therefore, limits scaling. The presented work investigates properties of dielectric materials in order to develop strategies for minimizing the total heat dissipation.

AB - Microfabricated ion traps are a key technology for trapped ion quantum computing. In chip-based ion traps metal layers are isolated by plasma enhanced chemical vapor deposited (PECVD) dielectrics. Both dielectric losses and charging currents of parasitic capacitances lead to power dissipation, which has adversely effects trap performance and, therefore, limits scaling. The presented work investigates properties of dielectric materials in order to develop strategies for minimizing the total heat dissipation.

UR - http://www.scopus.com/inward/record.url?scp=85125179049&partnerID=8YFLogxK

M3 - Conference paper

AN - SCOPUS:85125179049

SP - 363

EP - 364

BT - MikroSystemTechnik Kongress 2021

PB - VDE-Verlag GmbH, Berlin, Offenbach

T2 - MikroSystemTechnik Congress 2021

Y2 - 8 November 2021 through 10 November 2021

ER -

Dielectric Properties of Plasma Oxides for Microfabricated Ion Traps

Abstract

Konferenz

ASJC Scopus subject areas

Andere Dateien und Links

Fingerprint

Dieses zitieren