Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

Jo-Hyon Noh; Michael G. Stanford; Bret B. Lewis; T. Liang; Jason D. Fowlkes; Harald Plank; Philip D. Rack

doi:10.1007/s00339-014-8745-0

Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

Jo-Hyon Noh, Michael G. Stanford, Bret B. Lewis, T. Liang, Jason D. Fowlkes, Harald Plank, Philip D. Rack

Institut für Elektronenmikroskopie und Nanoanalytik (5190)

Publikation: Beitrag in einer Fachzeitschrift › Artikel › Begutachtung

Originalsprache	englisch
Seiten (von - bis)	1705-1713
Fachzeitschrift	Applied Physics A: Materials Science and Processing
Jahrgang	117
Ausgabenummer	4
DOIs	https://doi.org/10.1007/s00339-014-8745-0
Publikationsstatus	Veröffentlicht - 2014

Fields of Expertise

Advanced Materials Science

Treatment code (Nähere Zuordnung)

Application
Experimental

Zugriff auf Dokument

10.1007/s00339-014-8745-0

Functional Nanofabrication
Dohr, J., Plank, H., Rosker, S., Winkler, R., Stermitz, M., Reisecker, V., Michelitsch, S. G. W., Brugger-Hatzl, M., Schmied, R., Eicher, B., Orthacker, A., Arnold, G., Sattelkow, J., Kolb, F., Ganner, T., Haselmann, U., Seewald, L. & Aschl, T.
1/01/09 → …
Projekt: Foschungsprojekt

Dieses zitieren

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title = "Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair",

author = "Jo-Hyon Noh and Stanford, {Michael G.} and Lewis, {Bret B.} and T. Liang and Fowlkes, {Jason D.} and Harald Plank and Rack, {Philip D.}",

year = "2014",

doi = "10.1007/s00339-014-8745-0",

language = "English",

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journal = "Applied Physics A: Materials Science and Processing",

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TY - JOUR

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AU - Noh, Jo-Hyon

AU - Stanford, Michael G.

AU - Lewis, Bret B.

AU - Liang, T.

AU - Fowlkes, Jason D.

AU - Plank, Harald

AU - Rack, Philip D.

PY - 2014

Y1 - 2014

U2 - 10.1007/s00339-014-8745-0

DO - 10.1007/s00339-014-8745-0

M3 - Article

SN - 0947-8396

VL - 117

SP - 1705

EP - 1713

JO - Applied Physics A: Materials Science and Processing

JF - Applied Physics A: Materials Science and Processing

IS - 4

ER -

Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

Fields of Expertise

Treatment code (Nähere Zuordnung)

Zugriff auf Dokument

Projekte

Functional Nanofabrication

Dieses zitieren