Single Source Precursors in FEBID and FIBID: Similarities and Differences for CoSix Deposition

F. Jungwirth; F. Porrati; Daniel Knez; Harald Plank; Michael Huth; Sven Barth

Single Source Precursors in FEBID and FIBID: Similarities and Differences for CoSix Deposition

F. Jungwirth, F. Porrati, Daniel Knez, Harald Plank, Michael Huth, Sven Barth

Institut für Elektronenmikroskopie und Nanoanalytik (5190)

Publikation: Konferenzbeitrag › Poster

Abstract

One of the main challenges currently encountered in focused electron (FEBID) and ion beam induced deposition(FIBID) is the availability of suitable precursor molecules for desired material compositions [1]. Besides the depositionof single metal deposits, the deposition of binary materials with defined stoichiometry is very challenging. Anattractive approach to simplify the challenging task for metal silicides is the use of heterometallic precursors whichalready possess the desired constituent stoichiometry. This contribution compares two precursors for theFEBID/FIBID deposition of CoSix-based materials of predefined composition, H3SiCo(CO)4 and H2Si(Co(CO)4)2.

Originalsprache	englisch
Publikationsstatus	Veröffentlicht - 2022
Veranstaltung	8th FEBIP Workshop of the Focused-Electron-Beam-Induced-Processing: FEBIP 2022 - Krakow, Krakow, Polen Dauer: 12 Juli 2022 → 15 Juli 2022 https://acmin.agh.edu.pl/en/febip2022/

Konferenz

Konferenz	8th FEBIP Workshop of the Focused-Electron-Beam-Induced-Processing
Kurztitel	FEBIP 2022
Land/Gebiet	Polen
Ort	Krakow
Zeitraum	12/07/22 → 15/07/22
Internetadresse	https://acmin.agh.edu.pl/en/febip2022/

ASJC Scopus subject areas

Allgemeine Materialwissenschaften

Fields of Expertise

Advanced Materials Science

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)

Dieses zitieren

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abstract = "One of the main challenges currently encountered in focused electron (FEBID) and ion beam induced deposition(FIBID) is the availability of suitable precursor molecules for desired material compositions [1]. Besides the depositionof single metal deposits, the deposition of binary materials with defined stoichiometry is very challenging. Anattractive approach to simplify the challenging task for metal silicides is the use of heterometallic precursors whichalready possess the desired constituent stoichiometry. This contribution compares two precursors for theFEBID/FIBID deposition of CoSix-based materials of predefined composition, H3SiCo(CO)4 and H2Si(Co(CO)4)2.",

author = "F. Jungwirth and F. Porrati and Daniel Knez and Harald Plank and Michael Huth and Sven Barth",

year = "2022",

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TY - CONF

T1 - Single Source Precursors in FEBID and FIBID: Similarities and Differences for CoSix Deposition

AU - Jungwirth, F.

AU - Porrati, F.

AU - Knez, Daniel

AU - Plank, Harald

AU - Huth, Michael

AU - Barth, Sven

PY - 2022

Y1 - 2022

N2 - One of the main challenges currently encountered in focused electron (FEBID) and ion beam induced deposition(FIBID) is the availability of suitable precursor molecules for desired material compositions [1]. Besides the depositionof single metal deposits, the deposition of binary materials with defined stoichiometry is very challenging. Anattractive approach to simplify the challenging task for metal silicides is the use of heterometallic precursors whichalready possess the desired constituent stoichiometry. This contribution compares two precursors for theFEBID/FIBID deposition of CoSix-based materials of predefined composition, H3SiCo(CO)4 and H2Si(Co(CO)4)2.

AB - One of the main challenges currently encountered in focused electron (FEBID) and ion beam induced deposition(FIBID) is the availability of suitable precursor molecules for desired material compositions [1]. Besides the depositionof single metal deposits, the deposition of binary materials with defined stoichiometry is very challenging. Anattractive approach to simplify the challenging task for metal silicides is the use of heterometallic precursors whichalready possess the desired constituent stoichiometry. This contribution compares two precursors for theFEBID/FIBID deposition of CoSix-based materials of predefined composition, H3SiCo(CO)4 and H2Si(Co(CO)4)2.

M3 - Poster

T2 - 8th FEBIP Workshop of the Focused-Electron-Beam-Induced-Processing

Y2 - 12 July 2022 through 15 July 2022

ER -