Material Science
Adsorption
100%
Desorption
89%
Temperature
80%
Film Growth
64%
Thin-Film Transistor
32%
Nucleation
32%
Monolayers
29%
Density
24%
Chemisorption
20%
Silicon Dioxide
19%
Characterization
16%
Nickel
16%
Thin Film Deposition
16%
Particle
16%
Impurity
16%
Oxidation Reaction
16%
Dielectric Material
16%
Rod
16%
Atomic Force Microscopy
13%
Gas
12%
Ice
10%
Devices
10%
Adsorption Kinetics
9%
Crystals
9%
Wetting
9%
Water
8%
Photoemission Spectroscopy
8%
Potassium
8%
Saturation
8%
Auger Electron Spectroscopy
8%
X-Ray Diffraction
7%
Physical Vapor Deposition
7%
Semiconductor Material
5%
Oxide Semiconductor
5%
Analytical Method
5%
Film
5%
Morphology
5%
Chemistry
Desorption
73%
Adsorption
58%
Reaction Temperature
42%
Nickel
32%
Oxidation Reaction
32%
Dissociation
21%
Spectra
20%
Dioxygen
18%
Energetics
16%
Reactivity
16%
Multiphoton Ionization (MPI)
16%
Resonance Enhanced Multiphoton Ionization (REMPI)
16%
Chemisorption
16%
Low Energy Electron Diffraction
13%
Chemical Reaction
10%
Chemical Reaction Product
9%
Hydrogen
8%
Saturation
8%
Photoelectron Spectroscopy
8%
X-Ray Photoelectron Spectroscopy
8%
Molecule
8%
Work Function
5%
Engineering
Angle of Incidence
19%
Size Distribution
16%
Density
16%
Energetics
16%
Atomic Force Microscopy
16%
Independent Measurement
16%
Rate Dependence
16%
Review Article
16%
Crystal Orientation
16%
Sample Surface
16%
Monolayer
16%
Collimator
16%
Substrates
16%
Quantitative Measurement
16%
Experimental Result
16%
Ray Diffraction
16%
Structure Surface
16%
Models
16%
Surface
16%
Pentacene
16%
Mean Free Path
10%
Energy Distribution
8%
Coverage
8%
Electron Emission
8%
Fold Increase
8%
Secondary Electrons
8%
Low-Temperature
7%
Binding Energy
5%
Model Structure
5%
Plasmon Excitation
5%
Signal Intensity
5%
Core Level
5%
Photoelectron
5%
Quantitative Evaluation
5%
Crystal Surface
5%
Final Value
5%
Absolute Pressure
5%
Ionization Gauge
5%