Analysis of the mechanism of carbon removal from the GaAs(100) surface by atomic hydrogen

Pawel Tomkiewicz, Adolf Winkler, M Krzywiecki, Thomas Chasse, Josef Szuber

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@article{53a027a9629d46e3a8a9bd9ab5a621fa,

title = "Analysis of the mechanism of carbon removal from the GaAs(100) surface by atomic hydrogen",

author = "Pawel Tomkiewicz and Adolf Winkler and M Krzywiecki and Thomas Chasse and Josef Szuber",

year = "2008",

doi = "10.1016/j.apsusc.2008.03.074",

language = "English",

volume = "254",

pages = "8035--8040",

journal = "Applied Surface Science",

issn = "1873-5584",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Analysis of the mechanism of carbon removal from the GaAs(100) surface by atomic hydrogen

AU - Tomkiewicz, Pawel

AU - Winkler, Adolf

AU - Krzywiecki, M

AU - Chasse, Thomas

AU - Szuber, Josef

PY - 2008

Y1 - 2008

U2 - 10.1016/j.apsusc.2008.03.074

DO - 10.1016/j.apsusc.2008.03.074

M3 - Article

SN - 1873-5584

VL - 254

SP - 8035

EP - 8040

JO - Applied Surface Science

JF - Applied Surface Science

ER -