Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces

Alexandra Lex; Peter Pacher; Susanne Temmel; Quan Shen; Gregor Hlawacek; Oliver Werzer; Anna Maria Track; Paul Frank; Veronika Proschek; Robert Schennach; Georg Koller; Michael Ramsey; Christian Teichert; Roland Resel; Adolf Winkler; Egbert Zojer; Wolfgang Kern; Gregor Trimmel

Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces

Alexandra Lex, Peter Pacher, Susanne Temmel, Quan Shen, Gregor Hlawacek, Oliver Werzer, Anna Maria Track, Paul Frank, Veronika Proschek, Robert Schennach, Georg Koller, Michael Ramsey, Christian Teichert, Roland Resel, Adolf Winkler, Egbert Zojer, Wolfgang Kern, Gregor Trimmel

Research output: Chapter in Book/Report/Conference proceeding › Conference paper › peer-review

Original language	English
Title of host publication	Materials Research Society Fall Meeting
Publisher	.
Pages	231-231
Publication status	Published - 2007
Event	Materials Research Society Fall Meeting - Boston, United States Duration: 26 Nov 2007 → 30 Nov 2007

Conference

Conference	Materials Research Society Fall Meeting
Country/Territory	United States
City	Boston
Period	26/11/07 → 30/11/07

Treatment code (Nähere Zuordnung)

Application
Experimental

NFN Organic Films: Structural studies of ordered molecular films starting from the first monolayer, Photoreactive Surfaces
Trimmel, G. (Co-Investigator (CoI)), Koini, M. (Co-Investigator (CoI)), Haber, T. (Co-Investigator (CoI)), Kern, W. (Principal Investigator (PI)), Höfler, T. (Co-Investigator (CoI)) & Resel, R. (Principal Investigator (PI))
1/02/06 → 31/01/09
Project: Research project

Cite this

Lex, A., Pacher, P., Temmel, S., Shen, Q., Hlawacek, G., Werzer, O., Track, A. M., Frank, P., Proschek, V., Schennach, R., Koller, G., Ramsey, M., Teichert, C., Resel, R., Winkler, A., Zojer, E., Kern, W., & Trimmel, G. (2007). Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces. In Materials Research Society Fall Meeting (pp. 231-231). ..

Lex, A, Pacher, P, Temmel, S, Shen, Q, Hlawacek, G, Werzer, O, Track, AM, Frank, P, Proschek, V, Schennach, R, Koller, G, Ramsey, M, Teichert, C, Resel, R , Winkler, A , Zojer, E, Kern, W & Trimmel, G 2007, Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces. in Materials Research Society Fall Meeting. ., pp. 231-231, Materials Research Society Fall Meeting, Boston, United States, 26/11/07.

@inproceedings{8d18f7ea4fa14bb8a46f471df18ff5cc,

title = "Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces",

author = "Alexandra Lex and Peter Pacher and Susanne Temmel and Quan Shen and Gregor Hlawacek and Oliver Werzer and Track, {Anna Maria} and Paul Frank and Veronika Proschek and Robert Schennach and Georg Koller and Michael Ramsey and Christian Teichert and Roland Resel and Adolf Winkler and Egbert Zojer and Wolfgang Kern and Gregor Trimmel",

year = "2007",

language = "English",

pages = "231--231",

booktitle = "Materials Research Society Fall Meeting",

publisher = ".",

note = "Materials Research Society Fall Meeting ; Conference date: 26-11-2007 Through 30-11-2007",

}

TY - GEN

T1 - Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces

AU - Lex, Alexandra

AU - Pacher, Peter

AU - Temmel, Susanne

AU - Shen, Quan

AU - Hlawacek, Gregor

AU - Werzer, Oliver

AU - Track, Anna Maria

AU - Frank, Paul

AU - Proschek, Veronika

AU - Schennach, Robert

AU - Koller, Georg

AU - Ramsey, Michael

AU - Teichert, Christian

AU - Resel, Roland

AU - Winkler, Adolf

AU - Zojer, Egbert

AU - Kern, Wolfgang

AU - Trimmel, Gregor

PY - 2007

Y1 - 2007

M3 - Conference paper

SP - 231

EP - 231

BT - Materials Research Society Fall Meeting

PB - .

T2 - Materials Research Society Fall Meeting

Y2 - 26 November 2007 through 30 November 2007

ER -

Chemically and Photochemically Reactive Siloxane Layers for Modification of Inorganic Surfaces

Conference

Treatment code (Nähere Zuordnung)

Projects

NFN Organic Films: Structural studies of ordered molecular films starting from the first monolayer, Photoreactive Surfaces

Cite this