Copoly(2-​oxazoline)​-​based photoresists from renewable resources

Copoly(2-oxazoline)-based photoresists from renewable resources

Klaus Peter Luef, Charlotte Petit, Bruno Grassl, Stéphanie Reynaud, Frank Wiesbrock

Research output: Contribution to journal › Article

Original language	English
Article number	POLY-590
Number of pages	1
Journal	American Chemical Society Abstracts of Papers
Volume	251st ACS National Meeting & Exposition, San Diego, CA
Publication status	Published - 2016

This output contributes to the following UN Sustainable Development Goals (SDGs)

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title = "Copoly(2-oxazoline)-based photoresists from renewable resources",

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T1 - Copoly(2-oxazoline)-based photoresists from renewable resources

AU - Luef, Klaus Peter

AU - Petit, Charlotte

AU - Grassl, Bruno

AU - Reynaud, Stéphanie

AU - Wiesbrock, Frank

PY - 2016

Y1 - 2016

M3 - Article

VL - 251st ACS National Meeting & Exposition, San Diego, CA

JO - American Chemical Society Abstracts of Papers

JF - American Chemical Society Abstracts of Papers

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