[DE] FOTOLACK; [EN] PHOTORESIST; [FR] LAQUE PHOTOSENSIBLE

Frank Wiesbrock; Franz Stelzer; Verena Schenk; Lisa Ellmaier

[DE] FOTOLACK; [EN] PHOTORESIST; [FR] LAQUE PHOTOSENSIBLE

Frank Wiesbrock (Inventor), Franz Stelzer (Inventor), Verena Schenk (Inventor), Lisa Ellmaier (Inventor)

Institute for Chemistry and Technology of Materials (6380)

Research output: Patent

Original language	English
Patent number	WO 2013/036979 A1
Publication status	Published - 21 Mar 2013

Fields of Expertise

Advanced Materials Science

Generation of Smooth Surfaces Employing Polymer-Based Coatings
Rupp, B., Bodner, T., Bohnemann, K., Wiesbrock, F. & Stelzer, F.
1/07/09 → 31/12/09
Project: Research project

Cite this

@misc{93be7237409049ff8f7ea34d545d7452,

title = "[DE] FOTOLACK; [EN] PHOTORESIST; [FR] LAQUE PHOTOSENSIBLE",

author = "Frank Wiesbrock and Franz Stelzer and Verena Schenk and Lisa Ellmaier",

note = "Anmelder: AUSTRIA TECH & SYSTEM TECH, AT ; ELLMAIER LISA, AT ; POLYMER COMPETENCE CT LEOBEN GMBH, AT ; SCHENK VERENA, AT ; STELZER FRANZ, AT ; WIESBROCK FRANK, AT ;; WO 2013/036979 A1",

year = "2013",

month = mar,

day = "21",

language = "English",

type = "Patent",

}

TY - PAT

T1 - [DE] FOTOLACK; [EN] PHOTORESIST; [FR] LAQUE PHOTOSENSIBLE

AU - Wiesbrock, Frank

AU - Stelzer, Franz

AU - Schenk, Verena

AU - Ellmaier, Lisa

N1 - Anmelder: AUSTRIA TECH & SYSTEM TECH, AT ; ELLMAIER LISA, AT ; POLYMER COMPETENCE CT LEOBEN GMBH, AT ; SCHENK VERENA, AT ; STELZER FRANZ, AT ; WIESBROCK FRANK, AT ;

PY - 2013/3/21

Y1 - 2013/3/21

M3 - Patent

M1 - WO 2013/036979 A1

ER -

[DE] FOTOLACK; [EN] PHOTORESIST; [FR] LAQUE PHOTOSENSIBLE

Fields of Expertise

Projects

Generation of Smooth Surfaces Employing Polymer-Based Coatings

Cite this