Deep X-ray lithography on "sol-gel" processed noble metal mesoarchitectured films

Maxime Gayrard, Benedetta Marmiroli, Francois Chancerel, Philippe Decorse, Heinz Amenitsch, Jennifer Peron, Andrea Cattoni, Marco Faustini*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Noble metal coordination xerogel films (mesostructured with block-copolymers) exhibit solubility switching with increasing X-ray irradiation. Different from other sol-gel systems, these are attributed to film deconstruction under irradiation. These materials can be used as recyclable negative tone resists for deep X-ray lithography that can be further converted into metallic nanoarchitectured films.

Original languageEnglish
Pages (from-to)1706-1712
Number of pages7
JournalNanoscale
Volume14
Issue number5
DOIs
Publication statusPublished - 7 Feb 2022

ASJC Scopus subject areas

  • Materials Science(all)

Fields of Expertise

  • Advanced Materials Science

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