Depth profiling characterization of the nitride layers on gas nitrided commercially pure titanium

Malihe Mohammadi, Alireza Akbari*, Fernando Warchomicka, Luc Pichon

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


The thermochemical gas nitriding of the commercially pure titanium was conducted in a pure nitrogen atmosphere under the pressure of 2.5 × 105 and 4 × 105 Pa at the temperature ranging between 800 and 1323 K for 8 and 36 hours. The surface microstructures, chemical composition and hardness of the nitrided specimens were characterized using the scanning electron microscopy (SEM), Glow discharge optical emission spectroscopy (GDOES), X-ray diffraction (XRD), electron backscatter diffraction (EBSD), X-ray photoelectron spectroscopy (XPS), and Vickers micro hardness tester. The nitrided layers, comprising TiN, Ti2N and TiN0.3 phases, as well as a solid solution of nitrogen in the titanium so called diffusion zone were formed during the gas nitriding process. The thickness of the nitrided layers and diffusion zone varied with the processing temperature and pressure. Furthermore, oxygen and carbon impurities were detected in the outermost titanium nitride layer. The influence of the processing temperature and pressure on the chemical and phase composition, microstructure development, lattice parameters, texture evolution, hardness and chemical state of the main elements in the nitrided layers have been discussed.

Original languageEnglish
Article number111453
JournalMaterials Characterization
Publication statusPublished - Nov 2021


  • Diffusion zone
  • Gas nitriding
  • Nitrogen depth profile
  • TiN
  • Titanium nitride (TiN)
  • X-ray photoelectron spectroscopy (XPS)

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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