Abstract
Microfabricated ion traps are a key technology for trapped ion quantum computing. In chip-based ion traps metal layers are isolated by plasma enhanced chemical vapor deposited (PECVD) dielectrics. Both dielectric losses and charging currents of parasitic capacitances lead to power dissipation, which has adversely effects trap performance and, therefore, limits scaling. The presented work investigates properties of dielectric materials in order to develop strategies for minimizing the total heat dissipation.
Original language | English |
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Title of host publication | MikroSystemTechnik Kongress 2021 |
Subtitle of host publication | Mikroelektronik, Mikrosystemtechnik und ihre Anwendungen - Innovative Produkte fur zukunftsfahige Markte, Proceedings |
Publisher | VDE-Verlag GmbH, Berlin, Offenbach |
Pages | 363-364 |
Number of pages | 2 |
ISBN (Electronic) | 9783800756575 |
Publication status | Published - 2021 |
Event | MikroSystemTechnik Congress 2021: Microelectronics, Microsystems Engineering and their Applications - Innovative Products for Future-Oriented Markets - Stuttgart-Ludwigsburg, Germany Duration: 8 Nov 2021 → 10 Nov 2021 |
Conference
Conference | MikroSystemTechnik Congress 2021 |
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Country/Territory | Germany |
City | Stuttgart-Ludwigsburg |
Period | 8/11/21 → 10/11/21 |
ASJC Scopus subject areas
- Hardware and Architecture
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials