Dielectric Properties of Plasma Oxides for Microfabricated Ion Traps

Alexander Zesar, Helmut Schönherr, Michael Sieberer, David Seebacher, Clemens Rössler, Klemens Schüppert, Elmar Aschauer, Peter Hadley

Research output: Chapter in Book/Report/Conference proceedingConference paperpeer-review

Abstract

Microfabricated ion traps are a key technology for trapped ion quantum computing. In chip-based ion traps metal layers are isolated by plasma enhanced chemical vapor deposited (PECVD) dielectrics. Both dielectric losses and charging currents of parasitic capacitances lead to power dissipation, which has adversely effects trap performance and, therefore, limits scaling. The presented work investigates properties of dielectric materials in order to develop strategies for minimizing the total heat dissipation.

Original languageEnglish
Title of host publicationMikroSystemTechnik Kongress 2021
Subtitle of host publicationMikroelektronik, Mikrosystemtechnik und ihre Anwendungen - Innovative Produkte fur zukunftsfahige Markte, Proceedings
PublisherVDE-Verlag GmbH, Berlin, Offenbach
Pages363-364
Number of pages2
ISBN (Electronic)9783800756575
Publication statusPublished - 2021
EventMikroSystemTechnik Congress 2021: Microelectronics, Microsystems Engineering and their Applications - Innovative Products for Future-Oriented Markets - Stuttgart-Ludwigsburg, Germany
Duration: 8 Nov 202110 Nov 2021

Conference

ConferenceMikroSystemTechnik Congress 2021
Country/TerritoryGermany
CityStuttgart-Ludwigsburg
Period8/11/2110/11/21

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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