Porous silicon in the mesoporous regime is used as template for electrodeposition of ferromagnetic metals within the pores to fabricate self-assembled three dimensional arrays of nanotubes, nanowires or nanoparticles. Depending on the electrochemical deposition parameters the geometry of the metal deposits can be tuned and thus desired magnetic properties can be achieved. The morphology of the templates is modified due to different anodization processes. Additional to a conventional etching process magnetic field assisted etching is applied. Furthermore the magnetic properties in dependence on the morphological characteristics, especially the pore-growth of the porous silicon are investigated. An important point is the concomitant modification of the magnetic coupling of metal nanostructures of adjacent pores.
Fields of Expertise
- Advanced Materials Science
Treatment code (Nähere Zuordnung)
- Basic - Fundamental (Grundlagenforschung)