Extreme ultraviolet metalens by vacuum guiding

Marcus Ossiander*, Maryna Leonidivna Meretska, Hana Kristin Hampel, Soon Wei Daniel Lim, Nico Knefz, Thomas Jauk, Federico Capasso*, Martin Schultze*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Extreme ultraviolet (EUV) radiation is a key technology for material science, attosecond metrology, and lithography. Here, we experimentally demonstrate metasurfaces as a superior way to focus EUV light. These devices exploit the fact that holes in a silicon membrane have a considerably larger refractive index than the surrounding material and efficiently vacuum-guide light with a wavelength of ~50 nanometers. This allows the transmission phase at the nanoscale to be controlled by the hole diameter. We fabricated an EUV metalens with a 10-millimeter focal length that supports numerical apertures of up to 0.05 and used it to focus ultrashort EUV light bursts generated by high-harmonic generation down to a 0.7-micrometer waist. Our approach introduces the vast light-shaping possibilities provided by dielectric metasurfaces to a spectral regime that lacks materials for transmissive optics.
Original languageEnglish
Pages (from-to)59-63
Number of pages5
JournalScience
Volume380
Issue number6640
DOIs
Publication statusPublished - 7 Apr 2023

Keywords

  • metaoptics
  • extreme ultraviolet
  • attosecond
  • nanostructure
  • optics
  • silicon

ASJC Scopus subject areas

  • General

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