Fabrication of n- and p-Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self-Aligned Nanoimprinting

Ursula Palfinger; Christoph Auner; Herbert Gold; Anja Haase; Johanna Kraxner; Thomas Haber; Meltem Sezen; Werner Grogger; Georg Jakopic; Joachim R. Krenn; Barbara Stadlober

doi:10.1002/adma.201001947

Fabrication of n- and p-Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self-Aligned Nanoimprinting

Ursula Palfinger, Christoph Auner, Herbert Gold, Anja Haase, Johanna Kraxner, Thomas Haber, Meltem Sezen, Werner Grogger, Georg Jakopic, Joachim R. Krenn, Barbara Stadlober

Institute of Electron Microscopy and Nanoanalysis (5190)

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	5115-5119
Journal	Advanced Materials
Volume	22
DOIs	https://doi.org/10.1002/adma.201001947
Publication status	Published - 2010

Fields of Expertise

Advanced Materials Science

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)

Access to Document

10.1002/adma.201001947

Nanoimprint Lithography in Austria
Haber, T. & Grogger, W.
1/01/09 → 31/03/14
Project: Research project

Cite this

@article{de4e974f97bc4748a255c832873436a1,

title = "Fabrication of n- and p-Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self-Aligned Nanoimprinting",

author = "Ursula Palfinger and Christoph Auner and Herbert Gold and Anja Haase and Johanna Kraxner and Thomas Haber and Meltem Sezen and Werner Grogger and Georg Jakopic and Krenn, {Joachim R.} and Barbara Stadlober",

year = "2010",

doi = "10.1002/adma.201001947",

language = "English",

volume = "22",

pages = "5115--5119",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-VCH ",

}

TY - JOUR

T1 - Fabrication of n- and p-Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self-Aligned Nanoimprinting

AU - Palfinger, Ursula

AU - Auner, Christoph

AU - Gold, Herbert

AU - Haase, Anja

AU - Kraxner, Johanna

AU - Haber, Thomas

AU - Sezen, Meltem

AU - Grogger, Werner

AU - Jakopic, Georg

AU - Krenn, Joachim R.

AU - Stadlober, Barbara

PY - 2010

Y1 - 2010

U2 - 10.1002/adma.201001947

DO - 10.1002/adma.201001947

M3 - Article

SN - 0935-9648

VL - 22

SP - 5115

EP - 5119

JO - Advanced Materials

JF - Advanced Materials

ER -

Fabrication of n- and p-Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self-Aligned Nanoimprinting

Fields of Expertise

Treatment code (Nähere Zuordnung)

Access to Document

Projects

Nanoimprint Lithography in Austria

Cite this