Formation of monoclinic hafnium titanate thin films via the sol-gel method

Tongjit Kidchob, Paolo Falcaro, Piero Schiavuta, Stefano Enzo, Plinio Innocenzi*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


Hafnium titanate films are generating increasing interest because of their potential application as high-k dielectrics materials for the semiconductor industry. We have investigated sol-gel processing as an alternative route to obtain hafnium titanate thin films. Hafnia-titania films of different compositions have been synthesized using HfCl4 and TiCl4 as precursors. The HfO2-TiO2 system composition with 50 mol% of TiO2 and 50 mol% of HfO2 has allowed the formation of a hafnium titanate film after annealing at 1000°C. The films exhibited a homogeneous nanocrystalline structure and a monoclinic hafnium titanate phase that has never been obtained before in thin films. The films resulted in the formation of homogeneously distributed nanocrystals with an average size of 50 nm. Different compositions, with higher or lower hafnia contents, produced anatase crystalline films after annealing at 1000°C.

Original languageEnglish
Pages (from-to)2112-2116
Number of pages5
JournalJournal of the American Ceramic Society
Issue number7
Publication statusPublished - Jul 2008
Externally publishedYes

ASJC Scopus subject areas

  • Ceramics and Composites
  • Materials Chemistry

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