Highly reactive poly(2-oxazoline)-based photoresists with tunable properties

Martin Fimberger, Frank Wiesbrock

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)547-Poly-547-Poly
JournalAmerican Chemical Society Abstracts of Papers
Volume248
Publication statusPublished - 2014

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)
  • Experimental

Cite this