Idiosyncrasies of Physical Vapor Deposition Processes from Various Knudsen Cells for Quinacridone Thin Film Growth on Silicon Dioxide

Boris Renato Scherwitzl; Christian Werner Röthel; Andrew Owen Fletcher Jones; Birgit Kunert; Ingomar Salzmann; Roland Resel; Günther Leising; Adolf Winkler

doi:http://dx.doi.org/10.1021/acs.jpcc.5b04089

Idiosyncrasies of Physical Vapor Deposition Processes from Various Knudsen Cells for Quinacridone Thin Film Growth on Silicon Dioxide

Boris Renato Scherwitzl, Christian Werner Röthel, Andrew Owen Fletcher Jones, Birgit Kunert, Ingomar Salzmann, Roland Resel, Günther Leising, Adolf Winkler

Institute of Solid State Physics (5130)

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	20900-20910
Journal	The Journal of Physical Chemistry C
Volume	119
DOIs	https://doi.org/10.1021/acs.jpcc.5b04089
Publication status	Published - 2015

Fields of Expertise

Advanced Materials Science

Treatment code (Nähere Zuordnung)

Experimental

Access to Document

http://dx.doi.org/10.1021/acs.jpcc.5b04089

Cite this

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title = "Idiosyncrasies of Physical Vapor Deposition Processes from Various Knudsen Cells for Quinacridone Thin Film Growth on Silicon Dioxide",

author = "Scherwitzl, {Boris Renato} and R{\"o}thel, {Christian Werner} and Jones, {Andrew Owen Fletcher} and Birgit Kunert and Ingomar Salzmann and Roland Resel and G{\"u}nther Leising and Adolf Winkler",

year = "2015",

doi = "http://dx.doi.org/10.1021/acs.jpcc.5b04089",

language = "English",

volume = "119",

pages = "20900--20910",

journal = "The Journal of Physical Chemistry C",

issn = "1932-7455",

publisher = "American Chemical Society",

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T1 - Idiosyncrasies of Physical Vapor Deposition Processes from Various Knudsen Cells for Quinacridone Thin Film Growth on Silicon Dioxide

AU - Scherwitzl, Boris Renato

AU - Röthel, Christian Werner

AU - Jones, Andrew Owen Fletcher

AU - Kunert, Birgit

AU - Salzmann, Ingomar

AU - Resel, Roland

AU - Leising, Günther

AU - Winkler, Adolf

PY - 2015

Y1 - 2015

U2 - http://dx.doi.org/10.1021/acs.jpcc.5b04089

DO - http://dx.doi.org/10.1021/acs.jpcc.5b04089

M3 - Article

SN - 1932-7455

VL - 119

SP - 20900

EP - 20910

JO - The Journal of Physical Chemistry C

JF - The Journal of Physical Chemistry C

ER -