Novel Negative Photoresists Based on Poly(2-Oxazoline)s

Verena Schenk, Lisa Ellmaier, Elisabeth Rossegger, Frank Wiesbrock

Institute for Chemistry and Technology of Materials (6380)

Research output: Contribution to conference › Poster

2 results

Finished
Surface chemistry and adhesive properties of designed photoresist polymers
Fimberger, M., Mühlbacher, I., Stelzer, F., Schenk, V. & Wiesbrock, F.
1/01/10 → 31/12/13
Project: Research project
Synthetic approaches towards functional polymers
Mühlbacher, I., Kelly, A. M., Stelzer, F. & Wiesbrock, F.
1/01/10 → 31/12/13
Project: Research project