Reductive photopatterning of phenylene-vinylene-based polymers

T. Kavc, Gregor Langer, Wolfgang Kern, Andreas Ruplitsch, Arnulf-Kai Mahler, Franz Stelzer, Gertraud Hayn, Robert Saf, Emil List, Egbert Zojer, M.T. Ahmed, Alexander Pogantsch, Kurt Friedrich Iskra, Theo Neger, H. H. Hörhold, H. Tillmann, G. Kanzelbinder, E. Toussaere, G. Jakopic

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)BB11.3.1.-BB11.3.1.
JournalMaterials Research Society Symposium Proceedings
Publication statusPublished - 2002

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