TY - JOUR
T1 - Sliding Mode Control of a Distributed-Parameter Wafer Spin Clean Process
AU - Koch, Stefan
AU - Kleindienst, Martin
AU - Moreno, Jaime A.
AU - Horn, Martin
PY - 2020/10/21
Y1 - 2020/10/21
N2 - In this study, a temperature controller for chemical fluids, which are impinged on a rotating silicon wafer, is presented. The chemical fluid is heated by a heating plate that is mounted below the rotating wafer. The thermal behavior of the system is modeled as a distributed-parameter system. In order to deal with this problem setting, a second-order sliding mode controller is proposed. The controller is inspired by the finite-dimensional generalized super-twisting algorithm. Finite-time convergence despite the presence of a certain class of disturbances is proven by means of a Lyapunov function. The algorithm is implemented and tested on the real system.
AB - In this study, a temperature controller for chemical fluids, which are impinged on a rotating silicon wafer, is presented. The chemical fluid is heated by a heating plate that is mounted below the rotating wafer. The thermal behavior of the system is modeled as a distributed-parameter system. In order to deal with this problem setting, a second-order sliding mode controller is proposed. The controller is inspired by the finite-dimensional generalized super-twisting algorithm. Finite-time convergence despite the presence of a certain class of disturbances is proven by means of a Lyapunov function. The algorithm is implemented and tested on the real system.
U2 - 10.1109/TCST.2020.3028936
DO - 10.1109/TCST.2020.3028936
M3 - Article
SN - 1558-0865
JO - IEEE Transactions on Control Systems Technology
JF - IEEE Transactions on Control Systems Technology
ER -