Structural Transitions in Asymmetric Poly(styrene)-block-Poly(lactide) Thin Films Induced by Solvent Vapor Exposure

C. Sinturel*, D. Grosso, Michael Boudot, Heinz Amenitsch, Marc A. Hillmyer, Alain Pineau, M. Vayer

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


Successive structural transitions in thin films of asymmetric poly(styrene)-block-poly(lactide) (PS–PLA) block copolymer samples upon exposure to tetrahydrofuran (THF) vapors have been monitored using atomic force microscopy (AFM) and both in situ and ex situ grazing incidence small-angle X-ray scattering (GISAXS). A direct link was established between the structure in the swollen state and the morphology formed in the dried state post solvent evaporation. This was related to the high incompatibility between the constituting blocks of the copolymer that thwarted the system from reaching the homogeneous disordered state in the swollen state under the specific conditions utilized in this study. Upon rapid solvent removal, the morphologies formed in the swollen state were trapped due the fast evaporation kinetics. This work provides a better understanding of the mechanisms associated with block copolymer thin film morphology changes induced by solvent vapor annealing.
Original languageEnglish
Pages (from-to)12146-12152
JournalACS Applied Materials & Interfaces
Issue number15
Publication statusPublished - 2014

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

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