TEM, EELS, and EFTEM: Application to Semiconductor Materials and Device Characterization

Werner Grogger; Christian Gspan; Bernhard Schaffer; Martina Dienstleder; Michael Rogers; Albert Brunegger; Ferdinand Hofer

TEM, EELS, and EFTEM: Application to Semiconductor Materials and Device Characterization

Werner Grogger, Christian Gspan, Bernhard Schaffer, Martina Dienstleder, Michael Rogers, Albert Brunegger, Ferdinand Hofer

Institute of Electron Microscopy and Nanoanalysis (5190)

Research output: Contribution to conference › (Old data) Lecture or Presentation

Original language	English
Publication status	Published - 15 Sept 2005
Event	Crystalline Defects and Contamination: Their impact and Control in Device Manufacturing IV - Grenoble Duration: 15 Sept 2005 → 16 Sept 2005

Conference

Conference	Crystalline Defects and Contamination: Their impact and Control in Device Manufacturing IV
City	Grenoble
Period	15/09/05 → 16/09/05

Cite this

@conference{5de9f90002ac40a4a5ebc975195a09c2,

title = "TEM, EELS, and EFTEM: Application to Semiconductor Materials and Device Characterization",

author = "Werner Grogger and Christian Gspan and Bernhard Schaffer and Martina Dienstleder and Michael Rogers and Albert Brunegger and Ferdinand Hofer",

year = "2005",

month = sep,

day = "15",

language = "English",

note = "Crystalline Defects and Contamination: Their impact and Control in Device Manufacturing IV ; Conference date: 15-09-2005 Through 16-09-2005",

}

TY - CONF

T1 - TEM, EELS, and EFTEM: Application to Semiconductor Materials and Device Characterization

AU - Grogger, Werner

AU - Gspan, Christian

AU - Schaffer, Bernhard

AU - Dienstleder, Martina

AU - Rogers, Michael

AU - Brunegger, Albert

AU - Hofer, Ferdinand

PY - 2005/9/15

Y1 - 2005/9/15

M3 - (Old data) Lecture or Presentation

T2 - Crystalline Defects and Contamination: Their impact and Control in Device Manufacturing IV

Y2 - 15 September 2005 through 16 September 2005

ER -