Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature

Engineering & Materials Science

• Atomic layer deposition 100%
• Thin films 61%
• Plasmas 60%
• Materials properties 54%
• Tuning 50%
• Crystallite size 32%
• Purging 30%
• Substrates 30%
• Zinc oxide 28%
• Refractive index 28%
• Optical properties 27%
• Oxide films 26%
• Temperature 26%
• Energy gap 24%
• Structural properties 23%
• Zinc 23%
• Oxygen 17%
• Textures 17%
• Carbon 16%

Physics & Astronomy

• atomic layer epitaxy 67%
• tuning 49%
• purging 48%
• oxygen plasma 38%
• plasma frequencies 36%
• room temperature 36%
• thin films 33%
• zinc oxides 31%
• oxide films 29%
• zinc 29%
• crystallites 28%
• radio frequencies 28%
• textures 27%
• manufacturing 27%
• refractivity 22%
• carbon 21%
• optical properties 21%
• temperature 9%

Chemistry

• Atomic Layer Epitaxy 75%
• Ambient Reaction Temperature 36%
• Liquid Film 31%
• Diethylzinc 27%
• Plasma 27%
• Zinc Oxide 21%
• Crystalline Texture 21%
• Refractive Index 20%
• Polycrystalline Solid 19%
• Crystallite 18%
• Band Gap 16%
• Optical Property 15%
• Dioxygen 10%
• Carbon Atom 10%
• Amount 9%
• Time 7%