TY - JOUR
T1 - Tuning the Optical Absorption of Anatase Thin Films Across the Visible-To-Near-Infrared Spectral Region
AU - Orgiani, Pasquale
AU - Perucchi, Andrea
AU - Knez, Daniel
AU - Ciancio, Regina
AU - Bigi, Chiara
AU - Chaluvadi, Sandeep Kumar
AU - Fujii, Jun
AU - Vobornik, Ivana
AU - Panaccione, Giancarlo
AU - Rossi, Giorgio
AU - Lupi, Stefano
AU - Pietro, Paola Di
PY - 2020/4/6
Y1 - 2020/4/6
N2 - The electronic properties of anatase titanium dioxide (TiO2) thin films epitaxially grown on LaAlO3 substrates are investigated by synchrotron-x-ray spectroscopy [x-ray absorption spectroscopy (XAS), x-ray photoemission spectroscopy (XPS), and angle-resolved photoemission spectroscopy (ARPES)] and infrared spectroscopy. The Ti3+ fraction in TiO2−x is varied either by changing the oxygen pressure during deposition or by postgrowth annealing in ultrahigh vacuum (UHV). Structural investigation of the TiO2 thin films provides evidence of highly uniform crystallographic order in both as-grown and in situ UHV-annealed samples. The increased amount of Ti3+ as a consequence of UHV annealing is calibrated by in situ XPS and XAS analysis. The as-grown TiO2 samples, with a low Ti3+ concentration, show distinct electronic properties with respect to the annealed films, namely, absorption in the midinfrared (MIR) region correlated with polaron formation, and another peak in the visible range at 1.6 eV correlated with the presence of localized defect states (DSs). With the increasing level of Ti3+ induced by the postannealing process, the MIR peak disappears, while the DS peak is redshifted to the near-infrared region at about 1.0 eV. These results indicate the possibility of tailoring the optical absorption of anatase TiO2 films from the visible to the near-infrared region.
AB - The electronic properties of anatase titanium dioxide (TiO2) thin films epitaxially grown on LaAlO3 substrates are investigated by synchrotron-x-ray spectroscopy [x-ray absorption spectroscopy (XAS), x-ray photoemission spectroscopy (XPS), and angle-resolved photoemission spectroscopy (ARPES)] and infrared spectroscopy. The Ti3+ fraction in TiO2−x is varied either by changing the oxygen pressure during deposition or by postgrowth annealing in ultrahigh vacuum (UHV). Structural investigation of the TiO2 thin films provides evidence of highly uniform crystallographic order in both as-grown and in situ UHV-annealed samples. The increased amount of Ti3+ as a consequence of UHV annealing is calibrated by in situ XPS and XAS analysis. The as-grown TiO2 samples, with a low Ti3+ concentration, show distinct electronic properties with respect to the annealed films, namely, absorption in the midinfrared (MIR) region correlated with polaron formation, and another peak in the visible range at 1.6 eV correlated with the presence of localized defect states (DSs). With the increasing level of Ti3+ induced by the postannealing process, the MIR peak disappears, while the DS peak is redshifted to the near-infrared region at about 1.0 eV. These results indicate the possibility of tailoring the optical absorption of anatase TiO2 films from the visible to the near-infrared region.
UR - https://doi.org/10.1103/PhysRevApplied.13.044011
U2 - 10.1103/PhysRevApplied.13.044011
DO - 10.1103/PhysRevApplied.13.044011
M3 - Article
SN - 2331-7019
VL - 13
JO - Physical Review Applied
JF - Physical Review Applied
IS - 4
M1 - 044011
ER -