Vanadium and Manganese Carbonyls as Precursors in Electron-Induced and Thermal Deposition Processes

Felix Jungwirth, Daniel Knez, Fabrizio Porrati, Alfons G. Schuck, Michael Huth, Harald Plank, Sven Barth*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The material composition and electrical properties of nanostructures obtained from focused electron beam-induced deposition (FEBID) using manganese and vanadium carbonyl precursors have been investigated. The composition of the FEBID deposits has been compared with thin films derived by the thermal decomposition of the same precursors in chemical vapor deposition (CVD). FEBID of V(CO)6 gives access to a material with a V/C ratio of 0.63–0.86, while in CVD a lower carbon content with V/C ratios of 1.1–1.3 is obtained. Microstructural characterization reveals for V-based materials derived from both deposition techniques crystallites of a cubic phase that can be associated with VC1−xOx. In addition, the electrical transport measurements of direct-write VC1−xOx show moderate resistivity values of 0.8–1.2 × 103 µΩ·cm, a negligible influence of contact resistances and signatures of a granular metal in the temperature-dependent conductivity. Mn-based deposits obtained from Mn2 (CO)10 contain ~40 at% Mn for FEBID and a slightly higher metal percentage for CVD. Exclusively insulating material has been observed in FEBID deposits as deduced from electrical conductivity measurements. In addition, strong tendencies for postgrowth oxidation have to be considered.

Original languageEnglish
Article number1110
JournalNanomaterials
Volume12
Issue number7
DOIs
Publication statusPublished - 1 Apr 2022

Keywords

  • CVD
  • electrical transport characteristics
  • FEBID
  • manganese
  • metal carbonyl
  • vanadium

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Materials Science(all)

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