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Abstract
Extreme ultraviolet (EUV) radiation is a key technology for material science, attosecond metrology, and lithography. Here, we experimentally demonstrate metasurfaces as a superior way to focus EUV light. These devices exploit the fact that holes in a silicon membrane have a considerably larger refractive index than the surrounding material and efficiently vacuum-guide light with a wavelength of ~50 nanometers. This allows the transmission phase at the nanoscale to be controlled by the hole diameter. We fabricated an EUV metalens with a 10-millimeter focal length that supports numerical apertures of up to 0.05 and used it to focus ultrashort EUV light bursts generated by high-harmonic generation down to a 0.7-micrometer waist. Our approach introduces the vast light-shaping possibilities provided by dielectric metasurfaces to a spectral regime that lacks materials for transmissive optics.
Originalsprache | englisch |
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Seiten (von - bis) | 59-63 |
Seitenumfang | 5 |
Fachzeitschrift | Science |
Jahrgang | 380 |
Ausgabenummer | 6640 |
DOIs | |
Publikationsstatus | Veröffentlicht - 7 Apr. 2023 |
ASJC Scopus subject areas
- Allgemein
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- 2 Laufend
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FWF - Meta-Optiken - Extrem-UV Meta-Optiken für die Attosekundenmikroskopie
1/04/23 → 31/03/26
Projekt: Forschungsprojekt
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EU - EUVORAM - Extrem-Ultraviolett-Meta-Optik für die Attosekunden-Mikroskopie
1/01/23 → 31/12/27
Projekt: Forschungsprojekt