Initial steps of rubicene film growth on silicon dioxide

Boris Renato Scherwitzl; Walter Lukesch; Andreas Hirzer; Jörg Albering; Günther Leising; Roland Resel; Adolf Winkler

Initial steps of rubicene film growth on silicon dioxide

Boris Renato Scherwitzl, Walter Lukesch, Andreas Hirzer, Jörg Albering, Günther Leising, Roland Resel, Adolf Winkler

Institut für Festkörperphysik (5130)

Publikation: Beitrag in einer Fachzeitschrift › Artikel › Begutachtung

Originalsprache	englisch
Seiten (von - bis)	4115-4123
Fachzeitschrift	The Journal of Physical Chemistry C
Jahrgang	117
Publikationsstatus	Veröffentlicht - 2013

Fields of Expertise

Advanced Materials Science

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)
Experimental

Dieses zitieren

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title = "Initial steps of rubicene film growth on silicon dioxide",

author = "Scherwitzl, {Boris Renato} and Walter Lukesch and Andreas Hirzer and J{\"o}rg Albering and G{\"u}nther Leising and Roland Resel and Adolf Winkler",

year = "2013",

language = "English",

volume = "117",

pages = "4115--4123",

journal = "The Journal of Physical Chemistry C",

issn = "1932-7455",

publisher = "American Chemical Society",

}

TY - JOUR

T1 - Initial steps of rubicene film growth on silicon dioxide

AU - Scherwitzl, Boris Renato

AU - Lukesch, Walter

AU - Hirzer, Andreas

AU - Albering, Jörg

AU - Leising, Günther

AU - Resel, Roland

AU - Winkler, Adolf

PY - 2013

Y1 - 2013

M3 - Article

SN - 1932-7455

VL - 117

SP - 4115

EP - 4123

JO - The Journal of Physical Chemistry C

JF - The Journal of Physical Chemistry C

ER -