Ingenieurwesen & Materialwissenschaft
Oxygen
100%
Partial pressure
73%
Thin films
58%
Rietveld analysis
58%
Optical emission spectroscopy
51%
Scanning electron microscopy
48%
Pulsed laser deposition
47%
Inductively coupled plasma
46%
Yttria stabilized zirconia
41%
Microelectrodes
41%
Phase structure
40%
Crystal structure
39%
X ray diffraction analysis
38%
Photolithography
38%
Electrochemical impedance spectroscopy
38%
Spectroscopy
34%
Transmission electron microscopy
31%
X ray diffraction
30%
Drying
29%
Sintering
29%
Capacitance
26%
Temperature
24%
Electrodes
23%
Acoustic impedance
22%
Substrates
21%
Physik & Astronomy
conductivity
81%
oxygen
74%
kinetics
74%
electronics
64%
partial pressure
59%
impedance
47%
freeze drying
44%
scanning electron microscopy
40%
optical emission spectroscopy
35%
photolithography
34%
coefficients
33%
yttria-stabilized zirconia
33%
diffraction
33%
spectroscopy
32%
thin films
31%
pulsed laser deposition
29%
x rays
27%
purity
26%
capacitance
24%
crystal structure
24%
sintering
23%
transmission electron microscopy
20%
electrodes
19%
temperature
18%
Chemie
Conductivity
82%
Dioxygen
60%
Partial Pressure
59%
Impedance Spectroscopy
47%
Pulsed Laser Deposition
40%
Surface
39%
Optical Emission Spectroscopy
38%
Scanning Transmission Electron Microscopy
35%
Freeze Drying
33%
Rietveld Refinement
30%
Inductively Coupled Plasma
30%
X-Ray Diffraction
30%
Sintering
25%
Resistance
19%
Scanning Electron Microscopy
18%
Purity
15%
Behavior as Electrode
15%
Crystal Structure
15%