Photolithographic Patterning of Polymer Surfaces Using the Photo-Fries Rearrangement: Selective Postexposure Reactions

Thomas Grießer, Thomas Höfler, Susanne Temmel, Wolfgang Kern, Gregor Trimmel

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@article{01f31c5e64af4483a86f6e510f9ba64a,

title = "Photolithographic Patterning of Polymer Surfaces Using the Photo-Fries Rearrangement: Selective Postexposure Reactions",

author = "Thomas Grie{\ss}er and Thomas H{\"o}fler and Susanne Temmel and Wolfgang Kern and Gregor Trimmel",

year = "2007",

language = "English",

volume = "19",

pages = "3011--3017",

journal = "Chemistry of Materials",

issn = "0897-4756",

publisher = "ACS Publications",

}

TY - JOUR

T1 - Photolithographic Patterning of Polymer Surfaces Using the Photo-Fries Rearrangement: Selective Postexposure Reactions

AU - Grießer, Thomas

AU - Höfler, Thomas

AU - Temmel, Susanne

AU - Kern, Wolfgang

AU - Trimmel, Gregor

PY - 2007

Y1 - 2007

M3 - Article

SN - 0897-4756

VL - 19

SP - 3011

EP - 3017

JO - Chemistry of Materials

JF - Chemistry of Materials

ER -