Plasma oxidation as a tool to design oxide films at low temperatures

Robert Schennach, T Grady, D.G. Naugle, J R Parga, H McWhinney, David L Cocke

Publikation: Beitrag in einer Fachzeitschrift › Artikel › Begutachtung

Originalsprache	englisch
Seiten (von - bis)	1965-1970
Fachzeitschrift	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Jahrgang	19
Ausgabenummer	4
DOIs	https://doi.org/10.1116/1.1380718
Publikationsstatus	Veröffentlicht - 2001

Treatment code (Nähere Zuordnung)

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author = "Robert Schennach and T Grady and D.G. Naugle and Parga, {J R} and H McWhinney and Cocke, {David L}",

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T1 - Plasma oxidation as a tool to design oxide films at low temperatures

AU - Schennach, Robert

AU - Grady, T

AU - Naugle, D.G.

AU - Parga, J R

AU - McWhinney, H

AU - Cocke, David L

PY - 2001

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JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

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