Advanced Process Control (APC) for Semiconductor Processing Equipment (II)

Hofbaur, Michael (Co-Investigator (CoI))
Staudegger, Felix (Co-Investigator (CoI))
Dourdoumas, Nicolaos (Principal Investigator (PI))

Institute of Automation and Control (4430)

Project: Research project

Status	Finished
Effective start/end date	1/08/05 → 31/07/07

1 Article

Analyses and Modeling of a Wet-Chemical-Etch Process on Rotating Silicon Wafers with an Impinging Etchant Jet
Staudegger, F., Hofbaur, M. & Kruwinus, H-J., 2009, In: Journal of the Electrochemical Society. 156, 5, p. H340-H345
Research output: Contribution to journal › Article › peer-review