Atmospheric Pressure Ion Deposition, a new technique for processing of functional materials to ultrathin structured films

Thomas E. Hamedinger, Thomas Steindl, Robert Saf

Research output: Chapter in Book/Report/Conference proceeding › Conference paper › peer-review

Original language	English
Title of host publication	7th International Conference on Nanostructured Materials - LMC
Place of Publication	Frankfurt am Main/Germany
Publisher	Druckhaus K. Schmitt Wwe.
Pages	35-35
Publication status	Published - 2004

Cite this

Atmospheric Pressure Ion Deposition, a new technique for processing of functional materials to ultrathin structured films. / Hamedinger, Thomas E.; Steindl, Thomas; Saf, Robert.
7th International Conference on Nanostructured Materials - LMC. Frankfurt am Main/Germany: Druckhaus K. Schmitt Wwe., 2004. p. 35-35.

Research output: Chapter in Book/Report/Conference proceeding › Conference paper › peer-review

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