Branched Hydrosilane Oligomers as Ideal Precursors for Liquid-Based Silicon-Film Deposition

Michael Haas, Viktor-Stavros Christopoulos, Judith Radebner, Michael Holthausen, Thomas Lainer, Lukas Schuh, Harald Matthias Fitzek, Gerald Kothleitner, Ana Torvisco Gomez, Roland Fischer, Odo Wunnicke, Harald Stüger

Research output: Contribution to journalArticle


Herein aconvenient synthetic method to obtain2,2,3,3-tetrasilyltetrasilane 3 and 2,2,3,3,4,4-hexasilylpentasi-lane 4 on amultigram scale is presented. Proton-coupled29Si NMR spectroscopyand single-crystal X-raycrystallogra-phy enabled unequivocal structural assignment. Owing to theirunique properties,which are reflected in their nonpyrophoriccharacter on contact with air and their enhanced lightabsorption above 250 nm, 3 and 4 are valuable precursorsfor liquid-phase deposition (LPD) and the processing of thinsilicon films.Amorphous silicon (a-Si:H) films of excellentquality were deposited starting from 3 and characterized byconductivity measurements,ellipsometry,optical microscopy,and Raman spectroscopy.
Original languageEnglish
Pages (from-to)14259-14262
JournalAngewandte Chemie
Publication statusPublished - 2017

ASJC Scopus subject areas

  • Materials Science(all)

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

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