Copper oxidation studied by in Situ Raman Spectroscopy

Research output: Chapter in Book/Report/Conference proceeding › Conference paper › peer-review

Original language	English
Title of host publication	Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics--2003
Publisher	.
Pages	E3.2.1-E3.2.6
Publication status	Published - 2003
Event	Materials Research Society symposium proceedings - San Francisco, United States Duration: 20 Mar 2003 → 25 Mar 2003

Conference	Materials Research Society symposium proceedings
Country/Territory	United States
City	San Francisco
Period	20/03/03 → 25/03/03

Cite this

@inproceedings{3b88a211c6e9429b892c90c78705b664,

title = "Copper oxidation studied by in Situ Raman Spectroscopy",

author = "Robert Schennach and Andreas Gupper",

year = "2003",

language = "English",

pages = "E3.2.1--E3.2.6",

booktitle = "Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics--2003",

publisher = ".",

note = "Materials Research Society symposium proceedings ; Conference date: 20-03-2003 Through 25-03-2003",

}

TY - GEN

T1 - Copper oxidation studied by in Situ Raman Spectroscopy

AU - Schennach, Robert

AU - Gupper, Andreas

PY - 2003

Y1 - 2003

UR - http://www.mrs.org

M3 - Conference paper

SP - E3.2.1-E3.2.6

BT - Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics--2003

PB - .

T2 - Materials Research Society symposium proceedings

Y2 - 20 March 2003 through 25 March 2003

ER -