Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks

Min Tu; Benzheng Xia; Dmitry E Kravchenko; Max Lutz Tietze; Alexander John Cruz; Ivo Stassen; Tom Hauffman; Joan Teyssandier; Steven De Feyter; Zheng Wang; Roland A Fischer; Benedetta Marmiroli; Heinz Amenitsch; Ana Torvisco Gomez; Miriam Velasquez Hernandez; Paolo Falcaro; Rob Ameloot

doi:10.1038/s41563-020-00827-x

Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks

Min Tu, Benzheng Xia, Dmitry E Kravchenko, Max Lutz Tietze, Alexander John Cruz, Ivo Stassen, Tom Hauffman, Joan Teyssandier, Steven De Feyter, Zheng Wang, Roland A Fischer, Benedetta Marmiroli, Heinz Amenitsch, Ana Torvisco Gomez, Miriam Velasquez Hernandez, Paolo Falcaro, Rob Ameloot^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

Metal–organic frameworks (MOFs) offer disruptive potential in micro- and optoelectronics because of the unique properties of these microporous materials. Nanoscale patterning is a fundamental step in the implementation of MOFs in miniaturized solid-state devices. Conventional MOF patterning methods suffer from low resolution and poorly defined pattern edges. Here, we demonstrate the resist-free, direct X-ray and electron-beam lithography of MOFs. This process avoids etching damage and contamination and leaves the porosity and crystallinity of the patterned MOFs intact. The resulting high-quality patterns have excellent sub-50-nm resolution, and approach the mesopore regime. The compatibility of X-ray and electron-beam lithography with existing micro- and nanofabrication processes will facilitate the integration of MOFs in miniaturized devices.

Original language	English
Pages (from-to)	93-99
Number of pages	7
Journal	Nature Materials
Volume	20
Issue number	1
DOIs	https://doi.org/10.1038/s41563-020-00827-x
Publication status	Published - Jan 2021

ASJC Scopus subject areas

Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering
General Chemistry
General Materials Science

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Tu, M., Xia, B., Kravchenko, D. E., Lutz Tietze, M., Cruz, A. J., Stassen, I., Hauffman, T., Teyssandier, J., De Feyter, S., Wang, Z., Fischer, R. A., Marmiroli, B., Amenitsch, H., Torvisco Gomez, A., Velasquez Hernandez, M., Falcaro, P., & Ameloot, R. (2021). Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks. Nature Materials, 20(1), 93-99. https://doi.org/10.1038/s41563-020-00827-x

Tu, M, Xia, B, Kravchenko, DE, Lutz Tietze, M, Cruz, AJ, Stassen, I, Hauffman, T, Teyssandier, J, De Feyter, S, Wang, Z, Fischer, RA, Marmiroli, B , Amenitsch, H , Torvisco Gomez, A, Velasquez Hernandez, M, Falcaro, P & Ameloot, R 2021, 'Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks', Nature Materials, vol. 20, no. 1, pp. 93-99. https://doi.org/10.1038/s41563-020-00827-x

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abstract = "Metal–organic frameworks (MOFs) offer disruptive potential in micro- and optoelectronics because of the unique properties of these microporous materials. Nanoscale patterning is a fundamental step in the implementation of MOFs in miniaturized solid-state devices. Conventional MOF patterning methods suffer from low resolution and poorly defined pattern edges. Here, we demonstrate the resist-free, direct X-ray and electron-beam lithography of MOFs. This process avoids etching damage and contamination and leaves the porosity and crystallinity of the patterned MOFs intact. The resulting high-quality patterns have excellent sub-50-nm resolution, and approach the mesopore regime. The compatibility of X-ray and electron-beam lithography with existing micro- and nanofabrication processes will facilitate the integration of MOFs in miniaturized devices.",

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doi = "10.1038/s41563-020-00827-x",

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AU - Tu, Min

AU - Xia, Benzheng

AU - Kravchenko, Dmitry E

AU - Lutz Tietze, Max

AU - Cruz, Alexander John

AU - Stassen, Ivo

AU - Hauffman, Tom

AU - Teyssandier, Joan

AU - De Feyter, Steven

AU - Wang, Zheng

AU - Fischer, Roland A

AU - Marmiroli, Benedetta

AU - Amenitsch, Heinz

AU - Torvisco Gomez, Ana

AU - Velasquez Hernandez, Miriam

AU - Falcaro, Paolo

AU - Ameloot, Rob

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AB - Metal–organic frameworks (MOFs) offer disruptive potential in micro- and optoelectronics because of the unique properties of these microporous materials. Nanoscale patterning is a fundamental step in the implementation of MOFs in miniaturized solid-state devices. Conventional MOF patterning methods suffer from low resolution and poorly defined pattern edges. Here, we demonstrate the resist-free, direct X-ray and electron-beam lithography of MOFs. This process avoids etching damage and contamination and leaves the porosity and crystallinity of the patterned MOFs intact. The resulting high-quality patterns have excellent sub-50-nm resolution, and approach the mesopore regime. The compatibility of X-ray and electron-beam lithography with existing micro- and nanofabrication processes will facilitate the integration of MOFs in miniaturized devices.

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JO - Nature Materials

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Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks

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