Abstract
Deep X-ray lithography combined with sol-gel techniques offers facile fabrication of controlled patterned films. Using sol-gel, different functional properties can be induced; deep X-ray lithography alters the functionality in the exposed regions. Miniaturized devices based on local property changes are easily fabricated: this technique requires no resist, enabling direct patterning of films in a one-step lithographic process. (Figure Presented).
Original language | English |
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Pages (from-to) | 4932-4936 |
Number of pages | 5 |
Journal | Advanced Materials |
Volume | 21 |
Issue number | 48 |
DOIs | |
Publication status | Published - 28 Dec 2009 |
Externally published | Yes |
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering