Fabrication of mesoporous functionalized arrays by integrating deep X-ray lithography with dip-pen writing

An integrated fabrication patterning process is proposed using deep X-ray lithography and dip-pen writing to prepare mesoporous patterned arrays. The study used a deep X-ray lithography to create pattern of mesostructured silica thin films. The study used selective template removal and silica polycondensation by synchrotron radiation. The study also used an optical microscopy to investigate the patterned films and the quality of the lithographic process. Small-angle X-ray scattering and transmission electron microscopy were used to analyze mesophase variation in the film, while Fourier Transform (FT) infrared imaging was used to determine the chemical changes. The method also can help to produce new functional materials that can be used for various applications including DNA nano-spotting and lab-on-a-chip devices.