Fabrication of mesoporous functionalized arrays by integrating deep X-ray lithography with dip-pen writing

Paolo Falcaro*, Stefano Costacurta, Luca Malfatti, Masahide Takahashi, Tongjit Kidchob, Maria Francesca Casula, Massimo Piccinini, Augusta Marcelli, Benedetta Marmiroli, Heinz Amenitsch, Piero Schiavuta, Plinio Innocenzi

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


An integrated fabrication patterning process is proposed using deep X-ray lithography and dip-pen writing to prepare mesoporous patterned arrays. The study used a deep X-ray lithography to create pattern of mesostructured silica thin films. The study used selective template removal and silica polycondensation by synchrotron radiation. The study also used an optical microscopy to investigate the patterned films and the quality of the lithographic process. Small-angle X-ray scattering and transmission electron microscopy were used to analyze mesophase variation in the film, while Fourier Transform (FT) infrared imaging was used to determine the chemical changes. The method also can help to produce new functional materials that can be used for various applications including DNA nano-spotting and lab-on-a-chip devices.

Original languageEnglish
Pages (from-to)1864-1869
Number of pages6
JournalAdvanced Materials
Issue number10
Publication statusPublished - 19 May 2008
Externally publishedYes

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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