Abstract
X-ray lithography has been first proposed almost 50 years ago, and the related LIGA process around 25 years ago. It is therefore a good time to make an analysis of the technique, with its pros and cons. In this perspective article, we describe X-ray lithography’s latest advancements. First, we report the improvement in the fabrication of the high aspect ratio and high-resolution micro/nanostructures. Then, we present the radiation-assisted synthesis and processing of novel materials for the next generation of functional devices. We finally draw our conclusion on the future prospects of the technique.
Originalsprache | englisch |
---|---|
Aufsatznummer | 835701 |
Seitenumfang | 8 |
Fachzeitschrift | Frontiers in Nanotechnology |
Jahrgang | 4 |
DOIs | |
Publikationsstatus | Veröffentlicht - 2022 |
ASJC Scopus subject areas
- Elektronische, optische und magnetische Materialien
- Atom- und Molekularphysik sowie Optik
- Elektrotechnik und Elektronik
- Biomedizintechnik
- Angewandte Informatik
Fields of Expertise
- Advanced Materials Science