Width determination of SiO2 films in Si-based devices using low-loss EFTEM: image contrast as a function of sample thickness

Bernhard Schaffer, Werner Grogger, Ferdinand Hofer

Institute of Electron Microscopy and Nanoanalysis (5190)

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	1-7
Journal	Micron
Issue number	34
Publication status	Published - 2003

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)

Analytical Characterization of Thin Layers and Interfaces Between Thin Layers in Semiconducting Materials Devices and Magnetic Multilayers by Means of EELS and EFTEM
Grogger, W., Hofer, F., Brunegger, A., Warbichler, P. & Kothleitner, G.
1/01/99 → 31/12/05
Project: Research area
Analytical Electron Microscopy
Schaffer, B., Hofer, F., Rogers, M., Mitterbauer, C. & Wewerka, K.
1/01/95 → 31/01/03
Project: Research area

Cite this

@article{e1724474d9ca48e88529413f8dcdb879,

title = "Width determination of SiO2 films in Si-based devices using low-loss EFTEM: image contrast as a function of sample thickness",

author = "Bernhard Schaffer and Werner Grogger and Ferdinand Hofer",

year = "2003",

language = "English",

pages = "1--7",

journal = "Micron",

issn = "0968-4328",

publisher = "Elsevier Limited",

number = "34",

}