Efficient Temperature Profile Estimation for Silicon Wafers based on Subspace Observers

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This work proposes a computationally ecient observation algorithm for the surface temperature profile of heated silicon wafers. The observer exploits the fact that only a few modes of the original large-order model are unstable or slowly converging. In this case, it suffices to modify only these modes by the observer's output feedback gain. Compared to classical observation techniques, the proposed method allows to compute the feedback gain for a state space of lower dimension, which reduces computational complexity. A comparison of the approach with the extended Kalman-Bucy filter using experimental data shows its appealing
Original languageEnglish
Title of host publicationIFAC-PapersOnLine: Proceedings of the 21st IFAC World Congress
Volume53 (2)
Publication statusPublished - 2020
Event21st IFAC World Congress - Virtuell, Germany
Duration: 12 Jul 202017 Jul 2020


Conference21st IFAC World Congress
Abbreviated titleIFAC 2020


  • subspace observer design
  • Lyapunov exponents
  • Nonlinear systems
  • Extended Kalman-Bucy Filter
  • linear time varying systems
  • reduced Riccati equation
  • wafer temperature estimation
  • rapid thermal processing


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