Efficient Temperature Profile Estimation for Silicon Wafers based on Subspace Observers

Markus Tranninger; Richard Seeber; Martin Steinberger; Martin Horn

doi:10.1016/j.ifacol.2020.12.1648

Efficient Temperature Profile Estimation for Silicon Wafers based on Subspace Observers

Markus Tranninger, Richard Seeber, Martin Steinberger, Martin Horn

Institut für Regelungs- und Automatisierungstechnik (4430)

Publikation: Beitrag in Buch/Bericht/Konferenzband › Beitrag in einem Konferenzband › Begutachtung

Abstract

This work proposes a computationally ecient observation algorithm for the surface temperature profile of heated silicon wafers. The observer exploits the fact that only a few modes of the original large-order model are unstable or slowly converging. In this case, it suffices to modify only these modes by the observer's output feedback gain. Compared to classical observation techniques, the proposed method allows to compute the feedback gain for a state space of lower dimension, which reduces computational complexity. A comparison of the approach with the extended Kalman-Bucy filter using experimental data shows its appealing
performance.

Originalsprache	englisch
Titel	IFAC-PapersOnLine: Proceedings of the 21st IFAC World Congress
Seiten	5952-5957
Band	53 (2)
DOIs	https://doi.org/10.1016/j.ifacol.2020.12.1648
Publikationsstatus	Veröffentlicht - 2020
Veranstaltung	21st IFAC World Congress - Virtuell, Deutschland Dauer: 12 Juli 2020 → 17 Juli 2020

Konferenz

Konferenz	21st IFAC World Congress
Kurztitel	IFAC 2020
Land/Gebiet	Deutschland
Ort	Virtuell
Zeitraum	12/07/20 → 17/07/20

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10.1016/j.ifacol.2020.12.1648Lizenz: CC BY-NC-ND 4.0

Tranninger 2020 - Efficient Temperature Profile Estimation for Silicon Wafers based on Subspace ObserversAkzeptiertes Autorenmanuskript, 912 KBLizenz: CC BY-NC-ND 4.0

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Boano, C. A., Kubin, G., Bloem, R., Horn, M., Pernkopf, F., Zakany, N., Mangard, S., Witrisal, K., Römer, K. U., Aichernig, B., Bösch, W., Baunach, M. C., Tappler, M., Malenko, M., Weiser, S., Eichlseder, M., Leitinger, E., Grosinger, J., Großwindhager, B., Ebrahimi, M., Alothman Alterkawi, A. B., Knoll, C., Teschl, R., Saukh, O., Rath, M., Steinberger, M., Steinbauer-Wagner, G. & Tranninger, M.
1/01/16 → 31/03/22
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@inproceedings{b7be25012a7b4467a4637dfbef3614f2,

title = "Efficient Temperature Profile Estimation for Silicon Wafers based on Subspace Observers",

abstract = "This work proposes a computationally ecient observation algorithm for the surface temperature profile of heated silicon wafers. The observer exploits the fact that only a few modes of the original large-order model are unstable or slowly converging. In this case, it suffices to modify only these modes by the observer's output feedback gain. Compared to classical observation techniques, the proposed method allows to compute the feedback gain for a state space of lower dimension, which reduces computational complexity. A comparison of the approach with the extended Kalman-Bucy filter using experimental data shows its appealingperformance.",

keywords = "subspace observer design, Lyapunov exponents, Nonlinear systems, Extended Kalman-Bucy Filter, linear time varying systems, reduced Riccati equation, wafer temperature estimation, rapid thermal processing",

author = "Markus Tranninger and Richard Seeber and Martin Steinberger and Martin Horn",

year = "2020",

doi = "10.1016/j.ifacol.2020.12.1648",

language = "English",

volume = "53 (2)",

pages = "5952--5957",

booktitle = "IFAC-PapersOnLine: Proceedings of the 21st IFAC World Congress",

note = "21st IFAC World Congress, IFAC 2020 ; Conference date: 12-07-2020 Through 17-07-2020",

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T1 - Efficient Temperature Profile Estimation for Silicon Wafers based on Subspace Observers

AU - Tranninger, Markus

AU - Seeber, Richard

AU - Steinberger, Martin

AU - Horn, Martin

PY - 2020

Y1 - 2020

N2 - This work proposes a computationally ecient observation algorithm for the surface temperature profile of heated silicon wafers. The observer exploits the fact that only a few modes of the original large-order model are unstable or slowly converging. In this case, it suffices to modify only these modes by the observer's output feedback gain. Compared to classical observation techniques, the proposed method allows to compute the feedback gain for a state space of lower dimension, which reduces computational complexity. A comparison of the approach with the extended Kalman-Bucy filter using experimental data shows its appealingperformance.

AB - This work proposes a computationally ecient observation algorithm for the surface temperature profile of heated silicon wafers. The observer exploits the fact that only a few modes of the original large-order model are unstable or slowly converging. In this case, it suffices to modify only these modes by the observer's output feedback gain. Compared to classical observation techniques, the proposed method allows to compute the feedback gain for a state space of lower dimension, which reduces computational complexity. A comparison of the approach with the extended Kalman-Bucy filter using experimental data shows its appealingperformance.

KW - subspace observer design

KW - Lyapunov exponents

KW - Nonlinear systems

KW - Extended Kalman-Bucy Filter

KW - linear time varying systems

KW - reduced Riccati equation

KW - wafer temperature estimation

KW - rapid thermal processing

U2 - 10.1016/j.ifacol.2020.12.1648

DO - 10.1016/j.ifacol.2020.12.1648

M3 - Conference paper

VL - 53 (2)

SP - 5952

EP - 5957

BT - IFAC-PapersOnLine: Proceedings of the 21st IFAC World Congress

T2 - 21st IFAC World Congress

Y2 - 12 July 2020 through 17 July 2020

ER -

Efficient Temperature Profile Estimation for Silicon Wafers based on Subspace Observers

Abstract

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