Efficient Temperature Profile Estimation for Silicon Wafers based on Subspace Observers

Publikation: Beitrag in Buch/Bericht/KonferenzbandBeitrag in einem KonferenzbandBegutachtung

Abstract

This work proposes a computationally ecient observation algorithm for the surface temperature profile of heated silicon wafers. The observer exploits the fact that only a few modes of the original large-order model are unstable or slowly converging. In this case, it suffices to modify only these modes by the observer's output feedback gain. Compared to classical observation techniques, the proposed method allows to compute the feedback gain for a state space of lower dimension, which reduces computational complexity. A comparison of the approach with the extended Kalman-Bucy filter using experimental data shows its appealing
performance.
Originalspracheenglisch
TitelIFAC-PapersOnLine: Proceedings of the 21st IFAC World Congress
Seiten5952-5957
Band53 (2)
DOIs
PublikationsstatusVeröffentlicht - 2020
Veranstaltung21st IFAC World Congress - Virtuell, Deutschland
Dauer: 12 Juli 202017 Juli 2020

Konferenz

Konferenz21st IFAC World Congress
KurztitelIFAC 2020
Land/GebietDeutschland
OrtVirtuell
Zeitraum12/07/2017/07/20

Dieses zitieren